Curvilinear Mask Patterning is a cutting-edge lithography technique that promises to maximize lithography entitlement by addressing complex design challenges and critical yield limiters. However, its ...
The eBeam initiative celebrated its 15 th anniversary at the recent SPIE Advanced Lithography + Patterning Conference. 130 members of the mask and lithography community attended the annual lunch to ...
Photronics Inc. today announced its Sub-Wavelength Reticle Solutions phase shift photomasks have been used to demonstrate the production of sub-100nm features using KrF (248nm) exposure technology.
TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP) (TOKYO: 7912) has successfully developed a photomask manufacturing process capable of accommodating the 3-nanometer (10-9 meter) lithography ...
Computer chips are undoubtedly one the great wonders of the modern world, incredible feats of engineering. And just when you thought they couldn't get any more complex and intriguing, here comes ...
In a milestone for the global semiconductor industry, Multibeam Corp. today introduced the MB platform, a first-of-a-kind Multicolumn E-Beam Lithography (MEBL) to make chip factories better. Their new ...
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Temperature Control in Lithography
Optical lithography is employed in manufacturing integrated circuits. It starts with attaching a photosensitive material—or photoresist—to the substrate. A photomask with the required pattern is ...
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