Glass masks contribute to EUV mask blanks market expansion by offering exceptional surface smoothness, dimensional stability, ...

This release is available in German. Smaller, even smaller, tiny. Miniaturization in chip manufacture is progressing at an impressive pace. Researchers continue to push the physical limits of ...

Intel has made significant strides in implementing High-NA EUV lithography by installing two High-NA litho machines, developing custom reticles as well as all-new optical proximity correction, and ...

Photronics Inc. today announced its Sub-Wavelength Reticle Solutions phase shift photomasks have been used to demonstrate the production of sub-100nm features using KrF (248nm) exposure technology.

B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plans to use High-NA EUV patterning for 14A process technology and onwards.

TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP) (TOKYO: 7912) has successfully developed a photomask manufacturing process capable of accommodating the 3-nanometer (10-9 meter) lithography ...

(Nanowerk News) In a breakthrough set to revolutionize the semiconductor industry, the School of Engineering of the Hong Kong University of Science and Technology (HKUST) has developed the world’s ...

An extremely large exposure field with fine resolution technology on a 515 mm x 510 mm panel is demonstrated — a new technology that will address the challenges of large package size processes.

The European Mask and Lithography Conference (EMLC) 2024 recently was held in Grenoble, France, and had about 190 participants from a wide range of companies and institutions. Being relatively new to ...

Research and innovation hub imec has produced patterned structures obtained after exposure with the 0.55NA EUV scanner in the joint ASML-imec High NA EUV Lithography Lab in Veldhoven, the Netherlands.

PORTLAND, Ore. — A German company is fielding modeling tools that can help chip makers assess the promise of immersion lithography. Putting a layer of water between a wafer and the stepper lens could ...

In a breakthrough set to revolutionize the semiconductor industry, the School of Engineering of Hong Kong University of Science and Technology (HKUST) has developed the first-of-its-kind ...