Robert J. Mears, CTO and Founder of Atomera will present a paper on the advanced applications of Oxygen Inserted (OI) Epitaxy (one class of Atomera’s MST® film) in the semiconductor industry.

The HALO 201 MBE is a gas analysis system for molecular beam epitaxy applications. Hiden’s HALO systems are intended for RGA, gas analysis and process monitoring applications such as leak detection, ...

BUFFALO, N.Y. — Scientists have grown thin films of two different crystalline materials on top of each other using an innovative technique called “dative epitaxy.” The researchers discovered the ...

InP-based epitaxial wafer demand will be promising for niche-market applications, particularly optical communication uses bolstered by continuous construction of large-size datacenters and ...

Ganvix, the US startup company developing blue vertical cavity surface-emitting lasers (VCSELs) based on nanoporous gallium nitride (GaN) semiconductor material, has agreed a collaboration with ...

Periods of history are often defined by the materials used to make critical tools — from the stone age to the bronze age to today — a period some experts regard as the silicon age. Silicon is used in ...

--(BUSINESS WIRE)--Atomera Incorporated (Nasdaq: ATOM): Room 320 (Level 3, Hawaii Convention Center), Honolulu, HI Robert J. Mears, CTO and Founder of Atomera will present a paper on the advanced ...

Scientists have grown thin films of two different crystalline materials on top of each other using an innovative technique called 'dative epitaxy.' The researchers discovered the method by surprise.